Silicon Carbide Semiconductor

SiC carrier Application: Extreme thin wafer is often placed on SiC carrier connected to a vacuum generator, and the wafer is fixed by vacuum suction. It is convenient for waxing, thinning, dewaxing, cleaning and cutting processes in the field of semiconductor and optoelectronic industries. Feature requirements: Good thermal conductivity to shorten the process time of waxing and dewaxing, improve production rate, and increase production efficiency The pore size is small and well distributed, and evenly adsorbs each small localized region of the whole wafer Acid and alkali resistance Why is Kallex better than others: Various sizes and specifications can be customized Having good flatness, parallelism, the smooth surface, and will not scratch the wafer Stable quality and fast delivery

SiC DC Plug Application: Semiconductor equipment's metal etching process parts.         Feature requirements: Resistance to plasma bombardment No particle issue High hardness and good wear resistance High corrosion resistance Good chemical stability Why is Kallex better than others: Customized services Stable quality and fast delivery Stably supply for more than 20 years Long lasting life Easy to save and low cost of maintenance Highly cost-performance ratio and competitive High market share

SiC finger (fork) Application: SiC fingers are used in automation wafer transfer equipment which has been widely applied in semiconductor, optoelectronic, solar energy industries. Feature requirements: The surface impedance can be controlled between 106~108Ω, which meets anti-ESD specifications The surface is easy to clean without the problems caused by particle High hardness, abrasion resistance High rigidity, good shock-resisting, not easy to bend and deform for long-term using Light weight, small vibration amplitude Why is Kallex better than others: Long lasting life and reducing maintenance expense  Customized services A variety of types and suitable for each equipment High quality and fast delivery Good stability of wafer transfer, improving the disadvantages of traditional alumina finger

SiC edge (focus) ring Application: SiC edge ring is used in silicon wafer etching process. Feature requirements: Good resistance to plasma bombardment Excellent gas corrosion resistant Wonderful thermal shock and thermal strain resistance Easy to clean surface, without particle issue Long-term use will not bend and deform Why is Kallex better than others: Customized services Many types available Stable quality and fast delivery

SiC cover plate Application: SiC cover plate is used as a holder during Si wafer thin film growth process in semiconductor industry. Feature requirements: High thermal conductivity and surface temperature uniformity  Good thermal shock resistance and thermal strain resistance Easy to clean surface, without particle issue Coating process has good stability Why is Kallex better than others: Customized services All kinds of types and suitable for each equipment High quality and fast delivery 

Nano-isolation solution Application: Vacuum systems in semiconductor industry Vacuum systems in LED industry Vacuum systems in LCD industry Inner wall and rotor surface of pump Vacuum pumping line Feature requirements: Prevent stick Prevent oxidation Prevent corrosion Why is Kallex better than others: Good durability Good performance for preventing chemical damage   Good performance for preventing particle stick Good performance for waterproof Eco-friendly material Good performance of anti-adhesion and easy to used